Determination of Silicon self-interstitial diffusivity using

zhangcunbiao

Determination of Silicon self-interstitial diffusivity using
isotopically pure 30
Silicon multi-layer
Shingo Setoa,∗, Tomohisa Sakaguchi
a
, Yukio Nakabayashi
a
, Satoru Matsumotoa
,
Junichi Murotab, Kazumi Wadac
, Takao Abed
a
Department of Electronics and Electrical Engineering, Keio University, 3-14-1 Hiyoshi, Kohoku, Yokohama 223-8522, Japan
b Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan
c
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.
d Isobe R&D Center, Shin-Etsu Handotai, 2-13-1 Isobe, annaka, Gunma 397-0127, Japan