阳光工匠光伏论坛

 找回密码
 立即注册
收藏本版 (1) |订阅

【晶硅铸锭技术资料库】 今日: 0|主题: 177|排名: 40 

作者 回复/查看 最后发表
预览 [文献] Engineering analysis of microdefect formation during attachment zhangcunbiao 2010-12-29 03484 zhangcunbiao 2010-12-29 21:39
预览 [文献] Energetics of oxygen species in crystalline and amorphous attachment zhangcunbiao 2010-12-29 03564 zhangcunbiao 2010-12-29 21:37
预览 [文献] Electronic levels of isolated and oxygen-perturbed hydrogen in attachment recommend zhangcunbiao 2010-12-29 03829 zhangcunbiao 2010-12-29 21:36
预览 [分享] 多晶铸锭技术 attach_img 光谷子 2010-12-26 05807 ceetech 2010-12-26 17:33
预览 [分享] 铸锭工艺讲解 attachment recommend agree 6911620sxw 2010-12-25 06150 6911620sxw 2010-12-25 10:19
预览 [文献] Effects of surface steps on oxygen and boron deposited on Si(1 0 0) attachment zhangcunbiao 2010-12-17 03205 zhangcunbiao 2010-12-17 17:37
预览 [文献] E ffect of oxygen precipitation on voids in bulk silicon attachment zhangcunbiao 2010-12-17 03000 zhangcunbiao 2010-12-17 17:36
预览 [文献] E ffect of nitrogen doping on the minority carrier lifetime in attachment zhangcunbiao 2010-12-17 02829 zhangcunbiao 2010-12-17 17:35
预览 [文献] Effect of heat treatment on carbon in attachment zhangcunbiao 2010-12-17 03368 zhangcunbiao 2010-12-17 17:32
预览 [文献] Effect of fluorine on boron diffusion under interstitial attachment zhangcunbiao 2010-12-17 03205 zhangcunbiao 2010-12-17 17:31
预览 [文献] Effect of enhanced pressure during annealing on the creation of attachment zhangcunbiao 2010-12-17 03387 zhangcunbiao 2010-12-17 17:30
预览 [文献] Early stages of oxygen clustering in hydrogenated Cz-Si: attachment zhangcunbiao 2010-12-17 03282 zhangcunbiao 2010-12-17 17:28
预览 [文献] Do we know the energy levels ofradiation defects in silicon? attachment zhangcunbiao 2010-12-17 02871 zhangcunbiao 2010-12-17 17:26
预览 [文献] DLTS study of oxygen precipitates in silicon annealed attachment agree zhangcunbiao 2010-12-17 02900 zhangcunbiao 2010-12-17 17:25
预览 [分享] MCS450安全操作规范 attach_img agree 6911620sxw 2010-12-17 04189 6911620sxw 2010-12-17 08:54
预览 [文献] Determination of Silicon self-interstitial diffusivity using attachment zhangcunbiao 2010-12-16 02966 zhangcunbiao 2010-12-16 20:26
预览 [文献] Degradation of carrier lifetime in Cz silicon attachment zhangcunbiao 2010-12-16 03496 zhangcunbiao 2010-12-16 20:25
预览 [文献] Defect generation in crystalline silicon irradiated with high attachment zhangcunbiao 2010-12-16 03575 zhangcunbiao 2010-12-16 20:24
预览 [文献] Silicon detectors: Damage, modelling and expected long-time behaviour attachment zhangcunbiao 2010-12-16 03049 zhangcunbiao 2010-12-16 20:23
预览 [文献] Czochralski silicon characterization by using thermoelectric attachment zhangcunbiao 2010-12-15 03411 zhangcunbiao 2010-12-15 18:51
预览 [文献] Crystal-related defects evolution during thin epitaxial layer growth attachment zhangcunbiao 2010-12-15 03237 zhangcunbiao 2010-12-15 18:50
预览 [文献] Complexes of the self-interstitial with oxygen in irradiated attachment zhangcunbiao 2010-12-15 03131 zhangcunbiao 2010-12-15 18:49
预览 [文献] Pressure-induced formation of electrically active centres attachment zhangcunbiao 2010-12-15 03484 zhangcunbiao 2010-12-15 18:47
预览 [文献] Combination of optical measurement and precipitation theory to attachment zhangcunbiao 2010-12-13 03411 zhangcunbiao 2010-12-13 19:17
预览 [文献] Chemical and structural characterization of oxygen attachment zhangcunbiao 2010-12-13 02589 zhangcunbiao 2010-12-13 19:14
预览 [文献] Characterization of the oxygen distribution in Czochralski silicon attachment zhangcunbiao 2010-12-13 02833 zhangcunbiao 2010-12-13 19:12
预览 [文献] Characterization of defects in annealed Czochralski-grown attachment zhangcunbiao 2010-12-13 03080 zhangcunbiao 2010-12-13 19:08
预览 [文献] Characterization of crystallographic defects in thermally oxidized attachment zhangcunbiao 2010-12-13 03178 zhangcunbiao 2010-12-13 19:07
预览 [文献] Characterisation of oxygen and oxygen-related defects in highly- and attachment zhangcunbiao 2010-12-13 02858 zhangcunbiao 2010-12-13 19:06
预览 [分享] Boron–oxygen complexes in Si attachment zhangcunbiao 2010-12-13 04133 zhangcunbiao 2010-12-13 19:03
预览 [文献] Behaviour of oxygen in CZ-silicon during 430–630°C heat attachment zhangcunbiao 2010-12-13 02868 zhangcunbiao 2010-12-13 19:02
预览 [文献] Anomalous oxygen precipitation near the vacancy and attachment zhangcunbiao 2010-12-13 03968 zhangcunbiao 2010-12-13 19:00
预览 [文献] Annealing studies of point defects in low dose MeV ion attachment zhangcunbiao 2010-12-13 03499 zhangcunbiao 2010-12-13 18:55
预览 [文献] Annealing Annealing effect and impurity doping effects on the defect generation attachment zhangcunbiao 2010-12-13 03572 zhangcunbiao 2010-12-13 18:54
预览 [文献] Annealing behaviors of vacancy in varied neutron irradiated attachment zhangcunbiao 2010-12-13 03552 zhangcunbiao 2010-12-13 18:52
预览 [文献] Analysis of the oxygen impurity atoms beneath the surface attachment zhangcunbiao 2010-12-13 03641 zhangcunbiao 2010-12-13 18:50
预览 [文献] Analysis of extended defects in nitrogen annealed CZ silicon by attachment zhangcunbiao 2010-12-13 03577 zhangcunbiao 2010-12-13 18:49
预览 [文献] accurate infrared absorption measure attachment zhangcunbiao 2010-12-13 03731 zhangcunbiao 2010-12-13 18:47
预览 [文献] Absorption coefficient of oxide precipitates in silicon wafers after attachment zhangcunbiao 2010-12-13 04189 zhangcunbiao 2010-12-13 18:43
预览 [文献] 太阳能级硅粉在等离子体中纯化研究 attachment zhangcunbiao 2010-12-11 03828 zhangcunbiao 2010-12-11 17:56
下一页 »

快速发帖

还可输入 80 个字符
您需要登录后才可以发帖 登录 | 立即注册

本版积分规则

手机版|Archiver|阳光工匠光伏论坛 ( 苏ICP备08005685号 )

GMT+8, 2024-11-23 21:59 , Processed in 1.078125 second(s), 5 queries , File On.

Powered by Discuz! X3.4

Copyright © 2001-2020, Tencent Cloud.

返回顶部 返回版块