论坛首页 › 【光伏电池片技术资料库】 › 表面钝化-1988年 stability of hydrogen in silicon nitride films deposited by low-

ken_song 发表于 2011-5-12 13:33:18

表面钝化-1988年 stability of hydrogen in silicon nitride films deposited by low-

SiNx：钝化 LPCVD, PECVD, 基础。

stability of hydrogen in silicon nitride films deposited by low-pressure and plasma enhanced chemical vapor deposition techniques

查看完整版本: 表面钝化-1988年 stability of hydrogen in silicon nitride films deposited by low-